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Simulation software "PEGASUS"

Simulation software for engineers using vacuum technology, plasma technology, thin film technology, and microfabrication technology!

"PEGASUS" is a simulation software for engineers involved in the development and manufacturing using vacuum technology in equipment manufacturers, material manufacturers, and device manufacturers. It consists of multiple modules with different functions, and by combining one or more modules, simulations can be performed according to customer requirements. It targets a wide range of industries and fields, including IT, space development, energy, and semiconductors. Please feel free to contact us if you have any inquiries. 【Features】 ■ Simulation software for engineers involved in the development and manufacturing using vacuum technology in equipment manufacturers, material manufacturers, and device manufacturers. ■ Capable of performing simulations related to many processes required in vacuum thin film technology. ■ Able to conduct simulations from gas phase simulations of equipment sizes to substrate surface simulations at the micron size, among others. *For more details, please download the PDF or feel free to contact us.

  • simulator

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Dynamic Monte Carlo Simulation Software (SASAMAL)

It is possible to perform calculations related to ion implantation or the sputtering phenomenon itself!

The "Dynamic Monte Carlo Simulation Software (SASAMAL)" is a simulation code based on the Monte Carlo method using two-body collision approximation. It calculates the sputtering rate when high-energy ions are incident on an amorphous target, the angular distribution and energy distribution of sputtered atoms, the percentage of backscattering of incident particles, their angular distribution and energy distribution, and the penetration depth of ions into the target (Depth Profile). It can be used to evaluate the ion energy dependence and incident angle dependence of sputtering rates for various materials, as well as to assess the surface modification processes of materials due to ion implantation. 【Features】 ■ Even when used alone, this product can perform calculations related to ion implantation or the sputtering phenomenon itself. ■ When combined with PIC-MCCM or DSMCM, it is possible to investigate the effects of a wide range of device parameters. ■ It can also evaluate the relationship between gas pressure in the device and sputtering rate. *For more details, please refer to the PDF materials or feel free to contact us.

  • simulator
  • Other analyses

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